Applied Materials extends production-proven SACVD (Sub-Atmospheric Chemical Vapor Deposition) technology to ≤90nm generations, delivering excellent step coverage and void-free gap fill with the Producer SACVD USG (undoped silicate glass) and Producer SACVD BPSG (borophosphosilicate glass) Eterna systems.  Targeted for low thermal budget, thin film applications, the Producer SACVD USG offers gate liner and spacer solutions with excellent step coverage and conformality. Producer SACVD BPSG Eterna provides void-free, high aspect ratio gap fill solutions with low thermal budget anneal for inter-level dielectric (ILD) applications.

With the high productivity and reliability of the Producer platform, these solutions provide high throughput processing with superior particle performance and ultra-low metallic contamination. Platform extendibility enables customers to leverage the Producer toolset for multiple process nodes.