| 04/14/2008 |
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| 04/14/2008 |
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| 12/04/2007 |
Applied Materials' New SEMVision G4 System Sets the Benchmark with Defect-Per-Second Review at 2nm Resolution |
| 11/26/2007 |
Applied Materials’ UVision 3 Sets Benchmark for Brightfield Inspection Sensitivity and Productivity |
| 12/06/2006 |
Applied Materials' UVision SP Solves Defect Inspection Challenges for Immersion Lithography at CNSE's Albany NanoTech |
| 07/03/2006 |
Applied Materials' UVision Inspection System and Producer HARP CVD System Win Semiconductor International Awards |
| 07/07/2005 |
Applied Materials Wins Semiconductor International Magazine's Best Product Award for SEMVision G2 FIB |
| 06/06/2005 |
Applied Materials Unlocks the Future of Defect Inspection with Breakthrough UVision System |
| 06/06/2005 |
Applied Materials Announces Breakthrough at Event in New York City |
| 05/19/2005 |
Applied Materials Process Diagnostics and Control Group Wins 2004 Supplier Excellence Award from Texas Instruments |
| 05/17/2005 |
Applied Materials Achieves Major Market Share Gains in 2004 |
| 02/25/2005 |
Applied Materials Slashes Mask Development Time with Industry's First Automated OPC Qualification Tool |
| 12/14/2004 |
AMD Orders Applied Materials Systems to Equip 300mm Fab |
| 11/29/2004 |
Applied Materials Releases Industry's Fastest, Most Powerful Defect Review Systems with New SEMVision G2 Family |
| 07/12/2004 |
Applied Materials Leads the Semiconductor Equipment Industry in the 65nm Revolution |
| 06/29/2004 |
Silterra Places Large Order with Applied Materials for Copper Technologies; Production-Ready Systems to Speed Technology Ramp |
| 05/25/2004 |
Chartered Selects Applied Materials' Advanced Transistor, Low k Interconnect and Inspection Technologies for 300mm Fab |
| 02/25/2004 |
First 65-nm X Architecture Interconnect Test Chip Produced at Applied Materials` Maydan Technology Center |
| 02/23/2004 |
Applied Materials Shatters Metrology Roadblocks for 65-45nm Production with Applied VeritySEM System |
