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CD-SEM and DFM Metrology Solutions
| SEM-Contour Based OPC Model Calibration through the Process Window, SPIE Advanced Lithography Conference, Feb. 2007 (482KB) |
| The Impact of Double Patterning on CD-SEM Metrology, SPIE Advanced Lithography Conference, Feb. 2007 (932KB) |
| MacroCD Contact Ellipticity Measurement for Lithography Tool Qualification, SPIE Advanced Lithography Conference, Feb. 2007 (445KB) |
| Sub-Nanometer CD-SEM Matching, SPIE Advanced Lithography Conference, Feb. 2007 (508KB) |
| Physical matching vs CD Matching for CD-SEM, SPIE Advanced Lithography Conference, Feb. 2007 (4.7MB) |
| Charging Measurement using SEM Embedded Energy Filter, SPIE Advanced Lithography Conference, Feb. 2007 (74KB) |
| Advanced Edge Roughness Measurement Application for Mask Metrology, SPIE Advanced Lithography Conference, Feb. 2007 (348KB) |
| CAD based Line/Space Mix-up Prevention for Reticle Metrology, SPIE Advanced Lithography Conference, Feb. 2007 (681KB) |
| Using design intent to qualify and control lithography manufacturing, SPIE Microlithograhy Conference, Feb 2006 (250KB) |
| Embedded Charge Investigation: Industry Concerns and Metrology Solutions, SPIE Microlithograhy Conference, Feb 2006 (999KB) |
| Automatic CD-SEM offline recipe creation for OPC qualification and process monitoring in a DRAM pilot-fab environment, SPIE Microlithograhy Conference, Feb 2006 (265KB) |
| Advanced CD-SEM matching methodologies for OPC litho cell-based matching verification, SPIE Microlithograhy Conference, Feb 2006 (734KB) |
| A novel approach to characterize trench depth and profile using the 3D tilt capability of a critical dimension-scanning electron microscopy at 65-nm technology node, SPIE Microlithograhy Conference, Feb 2006 (1.36MB) |
| Bias reduction in roughness measurement through SEM noise removal, SPIE Microlithograhy Conference, Feb 2006 (276KB) |
| Small feature accuracy challenge for CD-SEM metrology: physical model solution, SPIE Microlithograhy Conference, Feb 2006 (2.09MB) |
| Characterization of Memory Capacitor Profiles, SPIE Microlithography Conference, Feb 2005 (1.24MB) |
| Design Based Metrology: Advanced Automation for CD-SEM Recipe Generation, SPIE Microlithography Conference, Feb 2005 (292KB) |
| CD-SEM Metrology Macro CD Technology: Beyond the Average, SPIE Microlithography Conference, Feb 2005 (1.69MB) |
| Advanced Mask Metrology Enabling Full Characterization of Imprint Lithography Templates, SPIE Microlithography Conference, Feb 2005 (683KB) |
| Examination of Possible Primary Mechanisms for 193nm Resist Shrinkage, SPIE Microlithography Conference, Feb 2005 (484KB) |
| Impact of Averaging of CD-SEM Measurements on Process Stability in a Full Volume DRAM Production Environment, SPIE Microlithography Conference, Feb 2005 (1.80MB) |
| Height and Sidewall Angle SEM Metrology Accuracy, Society of Photo-Optical Instrumentation Engineers, February 2004 (839KB) |
| Contact Hole Edge Roughness: Circles vs. Stars, Society of Photo-Optical Instrumentation Engineers, February 2004 (989KB) |
| CD SEM Application for Generic Analysis of Two-Dimensional Features on Wafers and Reticles, Society of Photo-Optical Instrumentation Engineers, February 2004 (1.07MB) |
Defect Analysis
Patterned Wafer Inspection
| Immersion Lithography Defectivity Analysis, SPIE Advanced Lithography Conference, Feb. 2007 (953KB) |
| Polarization control for enhanced defect detection on advanced memory devices, SPIE Microlithograhy Conference, Feb 2006 (313KB) |
| Extending Inspection Limits Using a DUV-Laser-Based Bright-Field Inspection Tool, Micro Magazine, July 2005 (570KB) |
| Pattern-Related Defects Become Subtler, Deadlier, Semiconductor International, June 2005† |
| Effective Cost-Saving Method of Tool Monitoring Using Product Wafers in 300mm Fabs, IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, May 2004 (400KB) |
View Archive
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