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Dielectric Deposition Press Releases
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07/15/2008 Applied Materials’ New eHARP System Extends Production-Proven STI Gap-Fill Technology to 32nm and Beyond
05/08/2008
08/13/2007

Applied Materials' Producer GT Wins Rapid Acceptance, Achieves 100th System Shipment Milestone

06/04/2007
05/15/2007 Applied Materials Releases Industry's Most Advanced Strain Engineering Technology to Boost 45nm Transistor Speed
11/14/2006 Applied Materials Releases the Industry's Most Productive CVD Processing Platform -- the Applied Producer GT
07/11/2006 Applied Materials' Black Diamond II Drives Advanced Low k Technology for 45nm Chips
07/10/2006 Applied Materials Extends Lithography-Enabling Solutions with New Advanced Patterning Film
07/03/2006 Applied Materials' UVision Inspection System and Producer HARP CVD System Win Semiconductor International Awards
11/09/2005 Applied Materials Wins 2005 "Best CVD Product" Award from TSMC
07/08/2004 Applied Materials Releases Breakthrough Gap-Fill Technology with Applied Producer HARP System
06/15/2004 Applied Materials Strengthens Leadership Position in HDP-CVD; Ships 100th 300mm System
05/19/2004 Applied Materials Achieves Major CVD Milestone with 750 Applied Producer Systems Shipped
04/22/2004 Applied Materials' Black Diamond Low k Wins Best Product Award
03/25/2004 Chartered Selects Applied Materials' Advanced Transistor, Low k Interconnect and Inspection Technologies for 300mm Fab
02/04/2004 Chipmakers Break Low k Barrier, Take Leap Forward to Drive Next-Generation Electronics Using Applied Black Diamond

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