As the market leader in flat panel display PECVD technology, AKT has ten major processing platforms from the AKT-1600 PECVD for 360mm x 465mm substrates to the AKT-55K PECVD for 2200mm x 2500mm class substrates, which are used to make TFT-LCD displays for flat panel televisions. AKT's PECVD systems offer processes for multiple applications, including both doped and undoped amorphous silicon (a-Si), silicon oxide, silicon oxynitride (SiON), silicon nitride, and in-situ multi-layer depositions. Systems equipped with Remote Plasma Source Clean technology enable highly repeatable deposition for over one month of full production without wet cleaning.  AKT-55K PECVD is equipped with its innovative AKT-APX_L PECVD process chambers which enable excellent film uniformity and property for large size deposition.