Featured Media Kit:
SEMICON Japan

• Solves Critical Transistor Scaling Challenge with New Millisecond Anneal System
• Releases the Industry’s Most Advanced, Productive CMP Platform – the Reflexion GT
• Smart Emissions Control Solution Cuts Energy Use, Cost in Semiconductor Fabs

• Randhir Thakur, Senior Vice President, General Manager Silicon Systems
• Charlie Pappis, Corporate Vice President, General Manager Applied Global Services
• Bill McClintock, Corporate Vice President, General Manager Dielectric Systems and
  Chemical Mechanical Planarization Products
• Steve Ghanayem, Corporate Vice President, General Manager Metal Deposition and Front End Products

• Photo: Applied Reflexion GT CMP
  (hi-res / lo-res / caption)
• Photo: Applied Reflexion GT CMP
  (hi-res / lo-res / caption)
• Photo: Vantage Astra
  (hi-res / lo-res / caption)
• Photo: Vantage Astra
  (hi-res / lo-res / caption)
• Photo: iSYS (hi-res / lo-res / caption)
• Video: iSYS video

• Whitepaper: Bringing Efficiency to the Subfab
  (337KB, PDF)
• Backgrounder: Applied Reflexion GT CMP
  (32KB, PDF)
• Backgrounder: Applied Vantage Astra DSA
  (51KB, PDF)